CAMIO8 multi-sensor CMM software will be demonstrated. Source: LK Metrology

LK Metrology Inc. will be exhibiting at the 2018 IMTS in booth No. E-5060 on level three in the East Building of McCormick Place in Chicago, September 10-15. In a partnership with Nikon Metrology, LK Metrology will join Nikon in their booth and feature their Altera S multi-purpose, compact CMM, and their Altera M high-speed, production-type CMM with probe and laser scanning, including applications of Renishaw PH20 and REVO2 probes. All the LK Metrology CMMs will be fitted with CAMIO8 multi-sensor CMM software and Renishaw Modus software. In addition, a CMM robotic cell with an Altera S equipped with a Nikon L100 laser scanner will be demonstrated.

The Altera S is LK’s multi-purpose CMM with the most advanced capabilities in the compact CMM class. The machine is multi-sensor ready, allowing the user to expand the capability of the CMM as requirements change without the need for expensive controller upgrades.

The Altera M range of performance CMMs delivers exceptional throughput and enhanced precision for production applications. Exclusively designed for high-speed tactile probe scanning and laser scanner applications, the Altera M is the preferred choice for automotive and aerospace and other manufacturers of performance-critical components.

Proven in the most challenging application environments, LK’s new Camio 8.5 version software continues to be the CMM software choice for many of the world’s largest manufacturers. By leveraging the productivity benefits of Camio 8.5, manufacturers can focus on accelerating lead times and improving product quality while reducing costs. Camio’s interoperability across CMM platforms, sensor technology and manufacturing sites is a unique advantage that guarantees the longevity of investment in software and inspection programs.